Intern - F10 PEE CVD
Intern on the Fab 10N/X Process Engineering & Equipment (PEE) team focused on crater defects in the LAM TEOS CVD process. The role supports defect root-cause analysis, controlled process experiments, and evaluation of trade-offs between defect reduction and film performance in a high-volume manufacturing environment.
Work with engineers to analyze defect and yield data, run limited experiments under guidance, and deliver experimental results with clear technical recommendations.
Entry-level / Internship. Suitable for students or early-career candidates; specific years of experience not specified.
Core responsibilities include:
Must-have skills and attributes:
Nice-to-have:
Not specified.
Company: Micron Technology
Headquarters: Boise, Idaho, USA
Micron Technology is a global leader in memory and storage solutions, dedicated to transforming how the world uses information. The company offers a diverse portfolio of high-performance DRAM, NAND, and NOR memory products under the Micron and Crucial brands. With a commitment to customer focus and technological innovation, Micron drives advancements in artificial intelligence, 5G, and other data-centric applications, empowering users to learn, communicate, and progress.

Date Posted: 2026-05-12