EUV Mask BEOL R&D Engineer

Job Title

EUV Mask BEOL R&D Engineer

Role Summary

Member of the Mask Technology Center R&D team developing EUV mask back-end-of-line (BEOL) technologies to enable Micron's future High-NA EUV roadmap. The role combines hands-on experimentation, modeling, supplier engagement, and technology transition to process engineering teams.

This position owns high-visibility R&D programs focused on mask characterization, defect printability, inspection, metrology, and readiness for high-volume manufacturing.

Experience Level

Mid-level. Minimum 2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies.

Responsibilities

Core responsibilities include experimental development, analysis, and cross-functional transition of mask BEOL technologies.

• Lead R&D for BEOL mask characterization, quality enablement, defect printability rules, and imaging performance.
• Develop actinic inspection methods, automated defect classification, printability assessment, metrology, and defect repair processes.
• Perform physics-based modeling and lithography simulation to correlate mask properties with wafer performance.
• Define tool capability requirements, engage suppliers early, and guide technology selection and specifications.
• Collaborate with process engineering teams to transition developed technologies into BEOL processes.
• Mentor colleagues and coordinate cross-site and supplier collaborations for complex R&D efforts.

Requirements

Must-have items are minimum qualifications; preferred items improve candidacy.

• Must-have: 2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies.
• Must-have: Hands-on experience in experimental process development, metrology, or inspection workflows relevant to mask or wafer technologies.
• Nice-to-have: Experience with semiconductor mask, lithography, or wafer fabrication (EUV/DUV, advanced nodes).
• Nice-to-have: Knowledge of actinic mask inspection, defect printability analysis, or mask repair techniques.
• Nice-to-have: Background in BEOL/FEOL process control, mask qualification, or high-volume manufacturing and yield/defectivity challenges.
• Nice-to-have: Experience defining tool requirements, collaborating with equipment suppliers, lithography simulation, OPC, or advanced mask design.

Education Requirements

MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related technical field. The posting also accepts equivalent semiconductor-focused academic research experience in lieu of industry experience where noted.

About the Company

Company: Micron Technology

Headquarters: Boise, Idaho, USA

Micron Technology is a global leader in memory and storage solutions, dedicated to transforming how the world uses information. The company offers a diverse portfolio of high-performance DRAM, NAND, and NOR memory products under the Micron and Crucial brands. With a commitment to customer focus and technological innovation, Micron drives advancements in artificial intelligence, 5G, and other data-centric applications, empowering users to learn, communicate, and progress.