Staff Layout Designer, NVEG
Micron TechnologyJob Title
Staff Layout Designer, NVEG
Role Summary
The Staff Layout Designer will develop and prepare multi-dimensional layouts and provide detailed drawings of semiconductor devices from schematics. You will also lead major block developments while collaborating with various functional groups across global sites.
Experience Level
Senior level, with a minimum of 10 years of direct experience in semiconductor layout design.
Responsibilities
Key responsibilities include:
- Organize and prioritize logistics and resource allocations to meet deadlines.
- Contribute to group management and technical innovation.
- Assign resources, schedule tasks, and deliver quality-controlled results.
- Mentor junior team members effectively.
- Lead and improve layout efficiency through automation and new methodologies.
Requirements
Must-have qualifications:
- AS or AAS in Electronics, Electrical Engineering or related field.
- 10 years of direct experience in semiconductor layout design.
- Deep knowledge of EDA tools (Cadence Virtuoso, Synopsys, Calibre).
- Strong debugging, communication, and layout quality skills.
Nice-to-have qualifications:
- 15+ years of experience in semiconductor layout design.
- BS degree in related field.
- IC layout design experience with NAND, DRAM, or SRAM.
- Programming and AI skills relevant to layout workflow.
Education Requirements
AS or AAS in Electronics, Electrical Engineering, or a related field required; BS degree preferred.
About the Company
Company: Micron Technology
Headquarters: Boise, Idaho, USA
Micron Technology is a global leader in memory and storage solutions, dedicated to transforming how the world uses information. The company offers a diverse portfolio of high-performance DRAM, NAND, and NOR memory products under the Micron and Crucial brands. With a commitment to customer focus and technological innovation, Micron drives advancements in artificial intelligence, 5G, and other data-centric applications, empowering users to learn, communicate, and progress.
